Date: May 14, 2020
Time: 11:00 AM – 12:00 PM (EDT)
Abstract: Photolithography has always been the most important technique in microelectronics fabrication. It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate, or it can be directly written with a UV-laser equipment. It provides precise control of the shape and size of the objects it creates and can create patterns over an entire surface cost-effectively. The Georgia Tech Institute for Electronics and Nanotechnology (IEN) cleanroom provides various types of photolithography equipment to satisfy different processing needs. Each tool has its own unique characteristics and serves different purposes. In this seminar, a brief introduction to the equipment and patterning capabilities of the IEN will be presented. Common processing issues related to photolithography will also be discussed.
Bio: Dr. Hang Chen received his bachelor and master degrees in chemistry from Fudan University in Shanghai, China. He obtained his doctorate, also in chemistry, from Georgia Tech in 2005 and was a post-doc at the Nanotechnology Research Center before joining the IEN as a Research Scientist in 2008. Currently, he is the process support manager at IEN. His research interests include chemically sensitive field-effect transistors, MEMS-CMOS device integration, and organic electronics.
Participants are requested to register in advance so that we will be able to understand the technological background and needs of the audience, as well as to send timely webinar reminders.
Upcoming Technical Seminars
The Southeastern Nanotechnology Infrastructure Corridor (SENIC), housed at the Institute for Electronics and Nanotechnology at Georgia Tech, is hosting a series of online technical seminars open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research.
We invite you to join us at any of the lectures listed below by registering at the link at the bottom of the email.
- May 21: "Laser Micromachining at GT-IEN" (Mr. Richard Shafer)
- May 28: "Etching at GT-IEN: A Review of Processes and Equipment" (Dr. Mikkel Thomas)
The Series full abstracts and biographies may be found at this link.
Please feel free to forward this webinar announcement to your colleagues who may benefit from the event.
- Sincerely, the SENIC Support Team
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