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February 5, 2020
In this issue
From our sponsor
The ULVAC Enviro-Optima™ Resist Strip System performs high-speed photo resist removal at more than 10µ/min, with excellent repeatability and high reliability for the lowest COO. The small footprint Enviro-Optima™ system is well suited for all resist strip work including difficult to strip resists, like SU-8; residue removal and surface preparation applications.
 
Top Stories
A new wave of fan-out packaging growth
Key players from different business models are fueling new growth. More>>
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The history and future of DRAM architecture in different application domains: An analysis
Common trends and bottlenecks in DRAM architecture are identified. More>>
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Tech News
Designing and fabrication fully customized chips
Silicon chip technology has surprising and largely untapped possibilities for product innovation. But reliably fabricating these specialty chips requires a multidisciplinary team and a robust plan. More>>
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Nanoscale features through atomic layer processing
Atomic layer etching and deposition processes offer atomic scale control through the use of self-limiting reactions. More>>
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Business News
Plessey and WaveOptics announce strategic partnership using microLED display technology for smart glasses
Plessey, an embedded technologies developer at the forefront of microLED technology for the augmented reality (AR) and mixed reality (MR) display market, announced today at Photonics West its’ partnership with WaveOptics, the leading designer and manufacturer of diffractive waveguides. More>>
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Web Editor
Shannon Davis
603-547-5309
sdavis@semiconductordigest.com 
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